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Journal of Clinical Microbiology, May 2000, p. 1797-1803, Vol. 38, No. 5
0095-1137/00/$04.00+0
Copyright © 2000, American Society for Microbiology. All rights reserved.

Oxygen and Carbon Dioxide Regulation of Toxic Shock Syndrome Toxin 1 Production by Staphylococcus aureus MN8

Jeremy M. Yarwood and Patrick M. Schlievert*

Department of Microbiology, University of Minnesota Medical School, Minneapolis, Minnesota 55455

Received 16 July 1999/Returned for modification 19 November 1999/Accepted 11 February 2000

The production of toxic shock syndrome toxin 1 (TSST-1) by Staphylococcus aureus MN8 exposed to a range of oxygen concentrations (0 to 21% [vol/vol]) was examined in batch and thin-film cultures. The response of S. aureus to this range of oxygen concentrations was studied in the absence and in the presence of 7% (vol/vol) carbon dioxide. In the absence of carbon dioxide, TSST-1 production in batch cultures increased from negligible levels in the presence of oxygen concentrations of 1% or less to 500 ng/ml in the presence of 2% oxygen and then decreased to 70 ng/ml or less in the presence of oxygen concentrations of 6% and higher. In the presence of carbon dioxide, however, toxin production increased from negligible levels in the presence of 1% oxygen to 1,900 ng/ml in the presence of 21% oxygen. In thin-film cultures, TSST-1 production increased from nearly undetectable levels under anaerobic conditions to 1 and 10 µg/ml under 21% oxygen in the absence and presence of carbon dioxide, respectively. This study demonstrates the controlling effects of both oxygen and carbon dioxide on TSST-1 production.

* Corresponding author. Mailing address: Department of Microbiology, Medical School, University of Minnesota, Box 196 FUMC, 420 Delaware St. SE, Minneapolis, MN 55455. Phone: (612) 624-9471. Fax: (612) 626-0623. E-mail: pats{at}lenti.med.umn.edu.

Journal of Clinical Microbiology, May 2000, p. 1797-1803, Vol. 38, No. 5
0095-1137/00/$04.00+0
Copyright © 2000, American Society for Microbiology. All rights reserved.


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